FHR ALD 100
Atomic Layer Deposition
Precisely controlled growth of monolayer stacks
The veins of an ALD reactor…
FHR ALD 150
Atomic Layer Deposition
Precisely controlled growth of monolayer stacks
The veins of an ALD reactor…
FHR ALD 300
Atomic Layer Deposition
Precisely controlled growth of monolayer stacks
The veins of an ALD reactor…
FHR-ALD Atomic Layer Deposition
Atomic Layer Deposition Precisely controlled growth of monolayer stacks
The veins of an ALD reactor…
FHR Star Star600EOSS®
Sputtering system for the deposition of optical interference coatings on large substrates with…
FHR Star Star500EOSS®
Industrial magnetron sputtering system for the deposition of
optical layer stacks at highest…
FHR Star 300
SEMI Standard-compatible thin film process platform for industrial manufacturing of microelectronics…
FHR Star 220
Multi-purpose thin film process system for functional coatings and treatment on wafer-like substrates…
FHR Star 150 Co
Co-sputtering system for the deposition of functional layers for sensor applications, micro-…
FHR Star 100TetraCo
Co-sputtering system for the deposition of functional layers for sensor applications, micro-…
FHR Roll 1600 ITO
Roll-to-roll web coating system for the volume production of flexible electronics and state-of-the-art…
FHR Roll 300 PVD
Roll-to-roll deposition system with AVOTouch technology for functional coatings and treatment…
FHR Line 2500 TCO
Magnetron sputter system for the deposition of transparent conductive oxides (TCO)
Description…
FHR Line 600 V
Compact inline coating system with carrier turning unit for double-sided deposition
System description…
FHR.Boxx.400PVD
Single-chamber magnetron sputter system for small batch production of optics, MEMS & sensors…
