Industrial magnetron sputtering system for the deposition of
optical layer stacks at highest precision
System description
The magnetron sputtering system FHR.Star.500-EOSS® was designed for the manufacture of interference
optical systems. It is a specially developed vacuum coating system for the deposition of multiple optical
layers that meet highest demands on layer thickness uniformity and layer quality. A sputter-up arrangement
was chosen to be able to produce flawless layers. The sputtering system is suited to process flat and curved
substrates up to 200 mm in diameter. It features substrate heaters.
Process
- Sputtering deposition using cylindrical magnetrons (DC or MF mode)
- Sputtering deposition using planar magnetrons (DC, MF or RF mode)
- Plasma source for the oxidation of metallic layers
Customer benefits
- Excellent layer thickness uniformity thanks to
in-situ monitoring of the layer growth - Particle-free deposition thanks to
sputter-up arrangement of the cylindrical
magnetrons - Long target life thanks to tubular targets
with minimum wear-out drift (< 0.5 %) - Fully automated process control
- Recipe program generator for maximum
processing flexibility
Key figures
Special features
- CE label
- Made in Germany
Typical applications
- High-refractive oxides,
e.g. Nb2O5, Ta2O5 with
MF dual cylindrical magnetron - Low-refractive oxides,
e.g. SiO2 with
MF dual cylindrical magnetron - Dielectric layers using ceramic targets
on planar magnetron in RF mode - Multiple layers, e.g.
50×, 200×, 500×
