Sputtering system for the deposition of optical interference
coatings on large substrates with flat and curved surfaces
System description
The magnetron sputtering system FHR.Star.600-EOSS® was designed for the manufacture of interference
optical systems. It is a specially developed vacuum coating system for the deposition of multiple optical
layers that meet highest demands on layer thickness uniformity and layer quality. A sputter-up arrangement
was chosen to be able to produce flawless layers. The sputtering system is suited to process flat and curved
substrates up to 300 mm in diameter or 280 x 330 x 50 mm³. It features substrate heaters.
Process
- Sputtering deposition using cylindrical magnetrons (DC or MF mode)
- Sputtering deposition using planar magnetrons (DC, MF or RF mode)
- Plasma source for the oxidation of metallic layers
Customer benefits
- Excellent layer thickness uniformity thanks to
in-situ monitoring of the layer growth - Particle-free deposition thanks to
sputter-up arrangement of the cylindrical
magnetrons - Long target life thanks to tubular targets
with minimum wear-out drift (< 0.5 %) - Fully automated process control
- Recipe program generator for maximum
processing flexibility
Key figures
Special features
- CE label
- Made in Germany
Typical applications
- High-refractive oxides,
e.g. Nb22O5, Ta2O5 with
MF dual cylindrical magnetron - Low-refractive oxides, e.g. SiO2 with
MF dual cylindrical magnetron - Dielectric layers using ceramic targets
on planar magnetron in RF mode
