PRE HEATER SYSTEM
Our pre-heater provides rapid heating of large substrates before they enter the process chamber. You can use the pre-heater to give your substrate any initial temperature profile you want, allowing you to compensate for the actual cooling fingerprint of your reaction chamber for a uniformly high-quality end product.
Available as an auxiliary product for deposition systems (including atmospheric-pressure, vacuum and sputtering), it lets you make best use of your available floor space.
Features / benefits
| Product feature | Benefit for you |
| Accurate temperature control with extremely uniform temperature distribution | Less thermal stress for fewer breakages |
| High performance | Smaller system for better use of floor space and lower upfront investment |
| Energy-saving design | Lower operating costs |
| Highly responsive temperature controls | Improved end-product efficiency |
| Rapid return to production conditions after stoppages | Improved production efficiency with no “first panel effect” |
